Preparing Physical Structures for Electromagnetic Simulation - Revision history

Asabet at 19:27, 2 July 2018

2018-07-02T19:27:30Z

Asabet at 19:26, 2 July 2018

2018-07-02T19:26:06Z

Asabet at 19:17, 2 July 2018

2018-07-02T19:17:12Z

Kazem Sabet: /* Defining New Custom Materials */

2018-06-15T20:44:39Z

‎Defining New Custom Materials

Kazem Sabet: /* Defining New Custom Materials */

2018-06-15T20:44:03Z

‎Defining New Custom Materials

Kazem Sabet: /* A Review of Linear & Nonlinear Passive & Active Devices */

2018-06-11T14:46:02Z

‎A Review of Linear & Nonlinear Passive & Active Devices

Kazem Sabet: /* Locking the Mesh Density of Object Groups */

2017-06-11T16:13:02Z

‎Locking the Mesh Density of Object Groups

Kazem Sabet: /* The Triangular Surface Mesh Generator */

2017-06-11T16:12:08Z

‎The Triangular Surface Mesh Generator

Asabet at 16:29, 2 June 2017

2017-06-02T16:29:38Z

Kazem Sabet: /* The Triangular Surface Mesh Generator */

2017-05-15T13:51:46Z

‎The Triangular Surface Mesh Generator

@@ Line 612: / Line 612: @@
 <tr>
 <td>
-[[Image:MESH MAN12.png|thumb|left|480px|Locking the mesh density in the property dialog of a material group.]]
+[[Image:MESH MAN12.png|thumb|left|600px|Locking the mesh density in the property dialog of a material group.]]
 </td>
 </tr>

@@ Line 554: / Line 554: @@
 # Click the '''Mesh Settings''' [[File:mesh_settings.png]] button of the Simulate Toolbar.
-# The Mesh Settings dialog of the currently c=active [[EM.Cube]] module opens up.
+# The Mesh Settings dialog of the currently active [[EM.Cube]] module opens up.
 # From the '''Host''' drop-down list, select a line object. Note that only line parallel to one of the three principal axes are listed.
 # By default, the lumped source is placed at the midpoint of the host line object. You can modify the '''Offset''' parameter, which is measured from the start point of the line and is always positive.

@@ Line 337: / Line 337: @@
 <table>
 <tr>
-<td> [[Image:PMOM49.png|thumb|left|480px|Defining gap sources on an array of rectangle strip objects with a Chebyshev amplitude distribution.]] </td>
+<td> [[Image:PMOM49.png|thumb|left|480px|Defining gap sources on an array of rectangle strip objects.]] </td>
 </tr>
 </table>

@@ Line 111: / Line 111: @@
 <table>
 <tr>
-<td> [[Image:FDTD5F.png|thumb|left|600px|A new custom material entry in the Materials List.]] </td>
+<td> [[Image:FDTD5F.png|thumb|left|720px|A new custom material entry in the Materials List.]] </td>
 </tr>
 </table>

@@ Line 95: / Line 95: @@
 <table>
 <tr>
-<td> [[Image:FDTD5E.png|thumb|left|300px|The Add New Material dialog.]]
+<td> [[Image:FDTD5E.png|thumb|left|320px|The Add New Material dialog.]]
   </td>
 </tr>

@@ Line 439: / Line 439: @@
 <br />
-<b> The Diode Device </b>
+<b> The Nonlinear Diode Device </b>
 A diode is a rectifying device. The time-domain relationship between the voltage and current of a diode is given by the nonlinear equation:

@@ Line 619: / Line 619: @@
 <tr>
 <td>
-[[Image:MESH MAN9.png|thumb|left|640px|The geometry of two dielectric spheres with the same material properties but belonging to two different object groups.]]
+[[Image:MESH MAN9.png|thumb|left|540px|The geometry of two dielectric spheres with the same material properties but belonging to two different object groups.]]
 </td>
 </tr>
 <tr>
 <td>
-[[Image:MESH MAN11.png|thumb|left|640px|The FDTD mesh of the two dielectric spheres. The left sphere is meshed using a global density of 20 cells/&lambda;<sub>eff</sub>, while the right sphere is meshed using a locked density of 100 cells/&lambda;<sub>eff</sub>.]]
+[[Image:MESH MAN11.png|thumb|left|540px|The FDTD mesh of the two dielectric spheres. The left sphere is meshed using a global density of 20 cells/&lambda;<sub>eff</sub>, while the right sphere is meshed using a locked density of 100 cells/&lambda;<sub>eff</sub>.]]
 </td>
 </tr>
 <tr>
 <td>
-[[Image:MESH MAN10.png|thumb|left|640px|The top view of the mesh of the two dielectric spheres also showing the XY grid plane.]]
+[[Image:MESH MAN10.png|thumb|left|540px|The top view of the mesh of the two dielectric spheres also showing the XY grid plane.]]
 </td>
 </tr>

@@ Line 565: / Line 565: @@
 <table>
 <tr>
-<td> [[Image:PO2.png|thumb|360px|Two ellipsoids of different compositions.]] </td>
+<td> [[Image:PO2.png|thumb|420px|Two ellipsoids of different compositions.]] </td>
-<td> [[Image:PO3.png|thumb|360px|Trinagular surface mesh of the two ellipsoids.]] </td>
+</tr>
 </tr>
 </table>

@@ Line 275: / Line 275: @@
 == Calculating Scattering Parameters Using Prony's Method ==
-[[EM.Picasso]] provides a special source type called '''[[Glossary of EM.Cube's Excitation Sources#Scattering Wave Port | Scattering Wave Port]]''' that is specifically intended for computing the S-parameters of planar structures. This is done by analyzing the current distribution patterns on the port transmission lines. The discontinuity at the end of a port line (junction region) gives rise to a standing wave pattern in the line's current distribution. From the location of the current minima and maxima and their relative levels, one can determine the reflection coefficient at the discontinuity, <i>i.e.</i> the S<sub>11</sub> parameter. A more rigorous technique is Prony’s method, which is used for exponential approximation of functions. A complex function f(x) can be expanded as a sum of complex exponentials in the following form:
+[[EM.Picasso]] provides a special source type called '''[[Glossary_of_EM.Cube's_Materials,_Sources,_Devices_&_Other_Physical_Object_Types#Scattering_Wave_Port | Scattering Wave Port]]''' that is specifically intended for computing the S-parameters of planar structures. This is done by analyzing the current distribution patterns on the port transmission lines. The discontinuity at the end of a port line (junction region) gives rise to a standing wave pattern in the line's current distribution. From the location of the current minima and maxima and their relative levels, one can determine the reflection coefficient at the discontinuity, <i>i.e.</i> the S<sub>11</sub> parameter. A more rigorous technique is Prony’s method, which is used for exponential approximation of functions. A complex function f(x) can be expanded as a sum of complex exponentials in the following form:
 :<math> f(x) \approx \sum_{n=1}^N c_i e^{-j\gamma_i x} </math>

@@ Line 570: / Line 570: @@
 </table>
-=== Controlling the Resolution of Surface Mesh ===
+The following general rules apply to [[EM.Cube]]'s surface mesh generators:
 You can control the average mesh cell size using the "Mesh Density" parameter. By default, the mesh density of [[EM.Illumina]] and [[EM.Libera]] is expressed in terms of the free-space wavelength. The default mesh density is 10 cells per wavelength. This usually creates slightly more than 100 regular triangular cells per squared wavelength. The default mesh density of [[EM.Picasso]] is expressed in terms of the effective wavelength, which takes into account the material properties of a planar structure's substrate layers. The default planar mesh density is 20 cells per effective wavelength. Alternatively, you can base the definition of the mesh density on "Cell Edge Length" expressed in project units. [[EM.Terrano]]'s mesh density is always expressed in cell edge length and its default value is 100 units. This large edge length is intended to create the fewest number of triangular facets on cubic objects with rectangular faces.
 You can change the value of '''Mesh Density''' from the Mesh Settings dialog and generate a triangular mesh with a higher or lower resolution.
 Surface mesh generation in [[EM.Cube]] is a two-step process. First, a tessellated version of an object in your project workspace is created. Then, the tessellated object undergoes a surface re-meshing to generate regularized triangular cells. This process is fairly straightforward in the case of flat planar structures. For curved surfaces and curved solid objects, the quality of the initial tessellation of the object is very important and directly affects the quality of the final surface mesh. You can access some additional mesh parameters by clicking the {{key|Tessellation Options}} button of the Mesh Settings dialog. In the Tessellation Options dialog, you can change '''Curvature Angle Tolerance''' expressed in degrees, which as a default value of 15&deg;. This parameter can affect the shape of the mesh especially in the case of solid CAD objects. It determines the apex angle of the triangular cells of the primary tessellation mesh which is generated initially before cell regularization. Lower values of the angle tolerance result in a less smooth and more pointed mesh of curved surface like a sphere.
@@ Line 592: / Line 599: @@
 </tr>
 </table>
 == Locking the Mesh Density of Object Groups ==