Changes

The mesh density gives a measure of the number of cells per effective wavelength that are placed in various regions of your planar structure. The higher the mesh density, the more cells are created on the geometrical objects. Keep in mind that only the finite-sized objects of your structure are discretized. The free-space wavelength is defined as <math>\lambda_0 = \tfrac{2\pi f}{c}</math>, where f is the center frequency of your project and c is the speed of light in the free space. The effective wavelength is defined as <math>\lambda_{eff} = \tfrac{\lambda_0}{\sqrt{\varepsilon_{eff}}}</math>, where e_eff is the effective permittivity. By default, [[EM.Picasso]] generates a hybrid mesh with a mesh density of 20 cells per effective wavelength. The effective permittivity is defined differently for different types of traces and embedded object sets. This is to make sure that enough cells are placed in areas that might feature higher field concentration. For PEC and conductive sheet traces, the effective permittivity is defined as the larger of the permittivity of the two substrate layers just above and below the metallic trace. For slot traces, the effective permittivity is defined as the mean (average) of the permittivity of the two substrate layers just above and below the metallic trace. For embedded object sets, the effective permittivity is defined as the largest of the permittivities of all the substrate layers and embedded dielectric sets.

[[Image:PMOM44.png|thumb|400px|Deleting or curing defective triangular cells: Case 1.]]