Changes

Due to the different definitions of effective wavelength in different parts of your planar structure, you will see different mesh resolutions. For example, if you structure has several substrate layers with different permittivities, the mesh of metal traces on layers with a higher permittivity value will feature more cells than the mesh of metal traces on layers with a lower permittivity value even though the mesh density value is the same for the whole structure.

The planar MoM mesh generation process involves three steps:

Once a mesh is generated, it stays in the memory until the structure is changed or the mesh density or other settings are modified. Every time you view mesh, the one in the memory is displayed. You can force [[EM.Cube]] to create a new mesh from the ground up by selecting '''Menu > Simulate > Discretization > Regenerate Mesh''' or by right clicking on the '''Planar Mesh''' item in the '''Discretization''' section of the Navigation Tree and selecting '''Regenerate''' from the contextual menu.

You can change the settings of the planar mesh including the mesh type and density from the planar Mesh Settings Dialog. You can also change these settings while in the mesh view mode, and you can update the changes to view the new mesh. To open the mesh settings dialog, either click the '''Mesh Settings''' [[File:mesh_settings.png]] button of the '''Simulate Toolbar''' or select '''Menu > Simulate > Discretization > Mesh Settings...''', or by right click on the '''Planar Mesh''' item in the '''Discretization''' section of the Navigation Tree and select '''Mesh Settings...''' from the contextual menu, or use the keyboard shortcut '''Ctrl+G'''. You can change the mesh algorithm from the dropdown list labeled '''Mesh Type''', which offers two options: '''Hybrid''' and '''Triangular'''. You can also enter a different value for '''Mesh Density''' in cells per effective wavelength (λ_eff). For each value of mesh density, the dialog also shows the average "Cell Edge Length" in the free space. To get an idea of the size of mesh cells on the traces and embedded object sets, divide this edge length by the square root of the effective permittivity a particular trace or set. Click the '''Apply''' button to make the changes effective.

The Planar Mesh Settings dialog.

It is very important to apply the right mesh density to capture all the geometrical details of your planar structure. This is especially true for "field discontinuity" regions such as junction areas between objects of different side dimensions, where larger current concentrations are usually observed at sharp corners, or at the connection areas between metallic traces and PEC vias, as well as the areas around gap sources and lumped elements, as these create voltage or current discontinuities. For large planar structures, using a higher mesh density may not always be a practical option since it will quickly lead to a very large MoM matrix and thus growing the size of the numerical problem. Sometimes a slightly non-uniform mesh still produces stable numerical results. In other words, you may choose to increase the mesh resolution around the discontinuity regions only.

The Planar Mesh Settings dialog gives a few more options for customizing your planar mesh around geometrical and field discontinuities. You can check the check box labeled "'''Refine Mesh at Junctions'''", which increases the mesh resolution at the connection area between rectangular objects. Or you can check the check box labeled "'''Refine Mesh at Gap Locations'''", which may prove particularly useful when gap sources or lumped elements are placed on a short transmission line connected from both ends. Or you can check the check box labeled "'''Refine Mesh at Vias'''", which increases the mesh resolution on the cross section of embedded object sets and by extension at the connection regions of the metallic objects connected to them. [[EM.Cube]] typically doubles the mesh resolution locally at the discontinuity areas when the respective boxes are checked.

=== Checking Mesh Integrity ===

Setting the minimum allowable angle for non-defective triangular cells.

[[EM.Cube]]'s [[Planar Module]] provides different ways of controlling the mesh of a planar structure locally. Earlier you saw how to increase the mesh resolution at the discontinuity regions without affecting the mesh of uniform or regular areas of a planar structure. Another way of local mesh control is to lock the mesh density of certain traces or object sets. The mesh density that you specify in the Planar Mesh Settings dialog is a global parameter and applies to all the traces and embedded object sets in your project. However, you can lock the mesh of individual PEC, PMC and conductive sheet traces or embedded objects sets. In that case, the locked mesh density takes precedence over the global density. Note that locking mesh of object groups, in principle, is different than refining the mesh at discontinuities. In the latter case, the mesh of connection areas is affected. However, objects belonging to different traces cannot be connected to one another. Therefore, locking mesh can be useful primarily for isolated object groups that may require a higher (or lower) mesh resolution.