- Furnaces: Oxidation, Diffusion/Doping, LPCVD
- Lithography: Mask maker, ACS-200 Cluster Tool, AS200 Autostep, E-Beam, Spinners, Front and Backside Alignment (MA/BA-6, EVG 620, MJB-3), Hotplates/Ovens
- Plasma Tools: PECVD, RIE, STS DRIE, nP12 Plasma Activation Tool
- Metal Deposition: Enerjet Evaporator, Enerjet Sputter Coater, Gold Platting Station
- Wafer Bonding: SB6e, EVG501, CL200, Wire Bonder, Dicing Saw
- Metrology: Microscopes, Dektak, Ellipsometer, Nano-spec Thin Film Thickness Measuring System, Scanning Electron Micrograph Philips XL30 FEG, Zygo, Keithley 4200
- Wet Processing: Chemical Benches, Wet Anisotropic Etching, CPD